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直播回放 | 光斑尺寸可调的高均匀性线光斑半导体激光器系统

    
Time：2023-09-18 11:46:28

  

  

  
  		
  		
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2023年9月21日周四19：30，炬光科技光机系统技术专家华大成在光电汇直播平台“光言万物”发表题为《光斑尺寸可调的高均匀性线光斑半导体激光器系统》的专题演讲。






报告摘要



晶圆激光退火（Wafer Laser Annealing）是28nm及以下逻辑芯片制造前道工序中不可缺少的关键工艺之一。该工艺采用近红外波段半导体激光光源，通过多组不同功能的激光光学整形系统及光学匀化系统，在工作距离下达成12mm*70μm的极窄线激光光斑，将形成的高能量密度极窄激光光斑照射到晶圆表面，在不到1毫秒的时间内将表层原子层加热到1000°C以上再急速冷却，使晶圆表面局部形成超浅结和高激活结，从而有效减少前道工序中产生的晶圆电极缺陷，提高产品性能，提升晶圆生产良品率。



炬光科技推出的DLight®S系列半导体集成电路晶圆退火系统，结合产生光子的共晶键合技术、激光光源热管理技术、热应力控制技术以及调控光子的激光光束转换技术和光场匀化技术，产生一条长宽比达160:1的近红外波段极窄线光斑，并在光斑长度方向达到＞95%的能量均匀性和＞98%的能量稳定性。应用在半导体前道工序中的多种退火工艺。






DLight®S系列半导体集成电路晶圆退火系统



演讲人信息






华大成，浙江大学光学工程硕士毕业，光机系统技术专家，2019年加入炬光科技，长期从事高精密线光斑激光系统开发工作。

  
    
  
  

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